Effects of Oxygen Partial Pressure and Substrate Temperature on Optical Properties of Sputter Deposited Thin Films

Citation:
Alfred A, Musembi RJ, Waita SM, Mwabora JM. Effects of Oxygen Partial Pressure and Substrate Temperature on Optical Properties of Sputter Deposited Thin Films. United Kenya Club; 2013.

Abstract:

The effects of oxygen partial pressure and substrate temperature on optical properties of CuCrO_2 thin films deposited on float glass substrate by reactive DC magnetron sputtering system using CuCr alloy targets have been studied. The sputtering was performed in Argon (Ar) and Oxygen (O_2) atmosphere and the substrate temperature varied up to 263 °C. The optical constants: refractive index, n, extinction coefficient, k, dielectric constant, ε, and absorption coefficient, α, at different oxygen partial pressure and substrate temperatures were determined from measured transmittance and reflectance data fitted in SCOUT software for wavelength range 200-2247 nm. The optical studies gave energy band gap of about 2.47 eV at 0.153 μbar Po2 and 3.7 eV at 263 °C substrate temperature. The values obtained for Urbach energy were 0.27-0.31 eV for samples prepared at Po2 between 0.153-0.187 μbar and 0.81-1.45 eV for those prepared at substrate temperature of 263 °C and as-grown film, respectively.

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