Electrophoretic Deposition of Titanium Dioxide Thin Films for Photocatalytic water purification systems

Citation:
Nyongesa F, Aduda BO. "Electrophoretic Deposition of Titanium Dioxide Thin Films for Photocatalytic water purification systems." Advances in Materials. 2017;6(4):31-37.

Abstract:

In this study, electrophoretic deposition (EPD) technique was used to deposit titanium dioxide (TiO2) thin films on
conducting glass substrates for application in water purification from organic contaminants. Phenol was used as a model
pollutant. The EPD suspension related parameters and deposition conditions were first optimized for good quality film
deposits. The suspension stability and deposition conditions that result in good adherence of TiO2 particles to the substrate with
homogeneous film coatings, is ethanol with a pH of 3.0, a TiO2 solid loading of 4.0 wt%, a 0.2 wt% iodine concentration in the
solvent and a deposition voltage of 20.0V in a time of 210.0s. The photocatalytic activity of TiO2 thin films decreases
exponentially with the ultraviolet light (UV) illumination time and it is also dependent on film thickness, sintering temperature
and the intensity of the UV light. Highest rate of photocatalytic activity is observed at an optimal film thickness of 95.0 ±
2.0µm sintered at 300.0°C. The implications of these results are discussed for design of inexpensive waste water purification
systems for light industries before discharge into the ecosystem.
Keywords: Electrophoretic Deposition, Titanium Dioxide, Photocatalysis

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