Electrophoretic Deposition and Characterization of TiO2/Nb2O5 Composite Thin Films for Dye Sensitized Solar Cells

Citation:
Nguu J, Nyongesa F, Robinson Musembi, Aduda B. "Electrophoretic Deposition and Characterization of TiO2/Nb2O5 Composite Thin Films for Dye Sensitized Solar Cells.". 2018.

Abstract:

In this study, Electrophoretic Deposition (EPD) technique was used to fabricate TiO2/Nb2O5 composite
thin films on FTO coated glass for application as photoelectrodes in Dye Sensitized Solar Cells (DSSC). A
TiO2/Nb2O5 ratio of 1:1 was used in a 2-propanol suspension solution with a solid loading of 0.25g/L. Optical
investigations showed that the film with thickness of 5.5 µm deposited at 35.0 V for 90.0 s had the highest
transmittance of 55.0 % at a wavelength (λ) of 1,300 nm. The optical band gap energy (Eg) was 3.884 eV and was
found to be dependent on the annealing time. The solar cell fabricated from this film had an open circuit voltage
(VOC) of 0.66 V, fill factor (FF) of 57.0%, short current density (JSC) of 5.25 mA/cm2 and photo conversion
efficiency (PCE) of 2.0%. Electrochemical Impedance Spectroscopy (EIS) analysis indicate that the DSSC device
with thinner photoelectrodes have more efficient electron transport in the photoanode compared to thicker
photoelectrodes to achieve higher conversion efficiencies.
Keywords: electrophoretic deposition, dye-sensitized solar cell, TiO2/Nb2O5 composite thin films

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